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Good company with nice service and high quality and high reputation. One of our reliable supplier , goods are delivered in time and nice package.
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Material experts, rigorous processing, timely discovery of problems in design drawings and communication with us, thoughtful service, reasonable price and good quality, I believe we will have more cooperation.
Jorge

Thank you for your good after-sales service. Excellent expertise and technical support helped me a lot.
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Through very good communication all problems solved, satisfied with my purchase
Adrian Hayter

The goods purchased this time are very satisfied, the quality is very good, and the surface treatment is very good. I believe we will order the next order soon.

Contact Person : Nicole

Phone Number : 13186382597

Whatsapp : +8613186382597

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999%

Place of Origin	China
Brand Name	PRM
Certification	ISO9001
Model Number	custom
Minimum Order Quantity	1pc
Price	Negotiate
Packaging Details	Plywood case
Delivery Time	7~10 work days
Payment Terms	T/T, L/C
Supply Ability	5000kgs/month

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Whatsapp:0086 18588475571

Wechat: 0086 18588475571

Skype: sales10@aixton.com

If you have any concern, we provide 24-hour online help.

Product Details

Name	Tantalum Sputter Coating Target	Grade	RO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Purity	99.95% 99.99%	Shape	Disc & Plate
Size	As Per Customer's Drawing	Density	16.75g/cm3

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Product Description

High Purity Sputter Coating Tantalum Target Tantalum Disc Target

1. Specifications Of Sputter Coating Tantalum Target:

Sputter Coating Tantalum Target

Material: R05200, R05400, R05252 (Ta-2.5W), R05255 (Ta-10W)

Circular targets: Dia 25mm ~ 400mm x Thickness 3mm ~ 28mm

Rectangular targets: Thickness 1mm ~ 12.7mm x Width < 600mmx Length < 2000mm

Purity: >=99.95% or 99.99%

Surface: bright,polished

Condition: annealed

We can also process according to your request.

Grade	3N, 3N5, 4N, with Ta 99.99%min
Recrystallization	95%min
Grain size	ASTM 4 or finer
Surface finish	16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness	0.1mm or 0.15% max
Tolerance	+/-0.010" on all dimensions

High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999% 0

2. Chemical Composition Of Sputter Coating Tantalum Target:

Grade	Element content(wt%)
Grade	C	N	O	H	Fe	Si	Ni	Ti	Mo	W	Nb	Ta
Ta1	0.01	0.005	0.015	0.0015	0.005	0.005	0.002	0.002	0.01	0.01	0.05	Remain
Ta2	0.02	0.025	0.03	0.005	0.03	0.02	0.005	0.005	0.03	0.04	0.1	Remain
TaNb3	0.02	0.025	0.03	0.005	0.03	0.03	0.005	0.005	0.03	0.04	1.5~3.5	Remain
TaNb20	0.02	0.025	0.03	0.005	0.03	0.03	0.005	0.005	0.02	0.04	17~23	Remain
TaNb40	0.01	0.01	0.02	0.0015	0.01	0.005	0.01	0.01	0.02	0.05	35~42	Remain
TaW2.5	0.01	0.01	0.015	0.0015	0.01	0.005	0.01	0.01	0.02	2.0~3.5	0.5	Remain
TaW7.5	0.01	0.01	0.015	0.0015	0.01	0.005	0.01	0.01	0.02	6.5~8.5	0.5	Remain
TaW10	0.01	0.01	0.015	0.0015	0.01	0.005	0.01	0.01	0.02	9.0~11	0.1	Remain

3. Application Of Sputter Coating Tantalum Target:

Tantalum sputtering target is a tantalum sheet obtained through pressure processing. It has high chemical purity, small grain size, recrystallized structure and good consistency in three axes. It is mainly used in optical fibers, semiconductor wafers and integrated circuits. For sputter deposition coatings, tantalum targets can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important materials for thin film technology.

4. Advantage of our Sputter Coating target:

- polised surface with high quality.
- uniform grain with densified microstructure ensures longer use time.

- professional after-sales service.

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High Purity Sputter Coating Tantalum Target Tantalum Disc Target 99.95% 99.999% 3