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10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc

  • 10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc
  • 10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc
  • 10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc
  • 10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc
Place of Origin China
Brand Name PRM
Certification ISO9001
Model Number Custom
Minimum Order Quantity 1pc
Price Negotiate
Packaging Details Plywood case
Delivery Time 5~7days
Payment Terms T/T
Supply Ability 5tons/month

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Product Details
Name Tantalum Disc Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255
Thickness 0.2~50mm Diameter 10~600mm
Purity ≥99.95% Surface Machined Surface
Standard ASTM B708 Delivery Status Annealed
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Annealed Tantalum Round Plate

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10mm Thickness Tantalum Round Plate

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Annealed Ta Disc
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Product Description

Product Information:

 

Name   Tantalum Disc /Tantalum Round Plate
Grade   Ta1 Ta2 RO5200 RO5400 RO5252 RO5255
Purity    ≥99.95%
Size    0.2~50mm thickness  10~600mm diameter
Surface    Machined surface, no pits, scratches, stains, burrs and other defects
Standard    ASTM B708
Application   Mainly used in sputtering deposition coatings of optical fibers, semiconductor wafers and integrated circuits.

 

10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc 010mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc 1

 

Chemical Content of Tantalum Disc

 

Grade Main elements 　 Impurity content less than %
　 Ta Nb Fe Si Ni W Mo Ti Nb O C H N
Ta1 Remain —— 0.005 0.005 0.002 0.01 0.01 0.002 0.04 0.02 0.01 0.0015 0.01
Ta2 Remain —— 0.03 0.02 0.005 0.04 0.03 0.005 0.1 0.03 0.01 0.0015 0.01
TaNb3 Remain ＜3.5 0.03 0.03 0.005 0.04 0.03 0.005 —— 0.03 0.01 0.0015 0.01
TaNb20 Remain 17.0～23.0 0.03 0.03 0.005 0.04 0.03 0.005 —— 0.03 0.01 0.0015 0.01
Ta2.5W Remain 　 0.005 0.005 0.002 3 0.01 0.002 0.04 0.02 0.01 0.0015 0.01
Ta10W Remain 　 0.005 0.005 0.002 11 0.01 0.002 0.04 0.02 0.01 0.0015 0.01

 

Application:

 

Tantalum disc are mostly used as sputtering targets. They have high chemical purity, small grain size, good recrystallization structure and three-axis consistency. They are mainly used in sputtering deposition coatings of optical fibers, semiconductor wafers and integrated circuits. Tantalum Target materials can be used for cathode sputtering coatings, high vacuum getter active materials, etc., and are important thin film technology materials.

 

We can process other shape and size tantalum products,pls send us an inquiry for more information.

 

10mm Thickness Annealed Tantalum Round Plate ASTM B708 Ta Disc 2

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Annealed Tantalum Round Plate

10mm Thickness Tantalum Round Plate

Annealed Ta Disc