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RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD

Place of Origin China
Brand Name PRM
Certification ISO9001
Model Number Custom
Minimum Order Quantity 1pc
Price Negotiate
Packaging Details Plywood case
Delivery Time 5~7days
Payment Terms T/T
Supply Ability 5tons/month

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Whatsapp:0086 18588475571

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Product Details
Name Tantalum Rotating Target Grade RO5200,RO5400,RO5252,RO5255,Ta1 ,Ta2
Density 16.68 G/cm3 Atomic Weight 180.94788
Sputtering Method DC Thermal Conductivity 57 W/m.K
High Light

CVD Tantalum Rotating Target

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Ta1 Tantalum Target

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Tantalum Tube Target 100mm

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Product Description

Product Information:

 

Tantalum tube target is a tubular tantalum target, also known as tantalum rotating target.

 

Name Tantalum Rotating Target Tantalum Tube Target
Purity ≥99.95%
Grade RO5200,RO5400,RO5252,RO5255,Ta1,Ta2
Density 16.68g/cm3
Atomic weight 180.94788
Sputtering method DC
Thermal conductivity 57 W/m.K
Thermal expansion coefficient 6.3 x 10-6 /K
Size OD: 20~300mm Wall thickness: ≥ 0.5mm

 

RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD 0RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD 1

 

Application of Ta Rotating Target:

 

Tantalum tube target is a high-purity tantalum raw material for sputter deposition, which can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Details are as follows:


-For semiconductors;
-Chemical Vapor Deposition (CVD) displays;
-Physical Vapor Deposition (PVD) displays;
-Optical applications.

 

Note: We provide customized services. If you can't find the target you want, please contact us directly. We can customize according to your requirements.

 

RO5200 Ta1 Tantalum Rotating Target Tantalum Tube Target 100mm For CVD PVD 2